The case of project ULTRA Project ULTRA goal is to develop a Laser Ablation Propulsion (LAP) engine for miniaturized satellites with form factor of 10cm cube multiples. A class of satellites best known as ‘CubeSats’. Laser Ablation Propulsion (LAP) has been proposed as a satellite propulsion technique since the 1970’s, with primer focus on its […]
using nanopaterning techniques for advanced indoor lighting applications In the next 30 years (up to 2050), the number of people expected to be living in cities will almost double and indoor living/artificial lighting will need to carry comfort and well-being properties. Re-inventing indoor lighting is not a life-style priority, but a true global-scale social necessity […]
CW lasers can be a viable alternative to ultra-fast lasers in deep sub-micron 3D nano-scale manufacturing
Organic Electronics Design and Optimization Engineer
Innovative idea in combining laser lithography and OLED technologies gets Opticon the highly regarded ‘Seal of Excellence’ of the European Commission for Excellence, Impact, Quality and Efficiency of Implementation
Meet us at SPIE Advanced Lithography Conference in San Jose/CA and learn more about Opticon’s enabling technologies on CW laser paterning in the 30nm regime and beyond.
Early findings (2010) of our work go public. Presenting: ‘Multiphoton Laser Ablation Lithography (MP-LAL) using 375 nm Continuous Wave Lasers, Enabling Patterning down to the 30 nm Regime and beyond’ at MNE2015 Hauge/The Netherlands.
Early findings (2010) of our work on sub-100nm laser lithography, get an oral presentation approval for the 41st Micro and Nano Engineering Conference (MNE2015) taking place at 21-24 of September at The Hauge/The Netherlands.
Opticon Lectures on ‘Advancing state-of-the-art in Laser Lithography, Added-value services and products in Greece – The experience of Opticon ABEE’ at the Department of Materials Science/University of Patras
Opticon announces the installation and successful operation of the first, fully in-house made laser lithography tool, capable of creating features with critical dimension <100nm. Using company’s own Thin Film Laser Processing technology, Opticon pushes laser lithography limits well within e-beam territory.
